On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process

Applied Surface Science

Volumn 183, Issue 3-4, 2001, Pages 284-289

  Nagai, Hisao ^a   Inayoshi, Muneto ^a   Hori, Masaru ^a   Goto, Toshio ^a   Hiramatsu, Mineo ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b MEIJO UNIVERSITY   (Japan)

Author keywords

Ablation; Micromachining; Polytetrafluoroethylene; Synchrotron radiation

Indexed keywords

ABLATION; ABSORPTION; IRRADIATION; MICROMACHINING; PHOTONS; SYNCHROTRON RADIATION;

PHOTON ENERGY DISTRIBUTIONS; QUADRUPLE MASS SPECTROSCOPY (QMS);

POLYTETRAFLUOROETHYLENES;

EID: 0035965615     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00592-X     Document Type: Article

References (11)