Size distribution and anisotropy effects on the switching field distribution of Co/Pd multilayered nanostructure arrays

IEEE Transactions on Magnetics

Volumn 45, Issue 10, 2009, Pages 3554-3557

  Smith, Darren T ^a,b   Chang, Long ^a,b   Rantschler, James O ^a,b   Kalatsky, Valery ^a,b   Ruchhoeft, Paul ^a,b   Khizroev, Sakhrat ^c   Litvinov, Dmitri ^a,b  

^a University of Houston   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

^c University of California Riverside   (United States)

Author keywords

Magnetic multilayers; Patterned magnetic arrays; Switching field distribution

Indexed keywords

ION BEAMS; MAGNETIC MULTILAYERS; SIZE DISTRIBUTION; SWITCHING;

BIT-PATTERNED MEDIUM; EMPIRICAL CALCULATIONS; LINEAR RELATIONSHIPS; MAGNETIC ARRAYS; MULTILAYERED NANOSTRUCTURES; PROXIMITY LITHOGRAPHIES; SELF-DEMAGNETIZATION; SWITCHING FIELD DISTRIBUTION;

ANISOTROPY;

EID: 71049145368     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2009.2025186     Document Type: Article

References (16)

1. D. Litvinov, C. E, V. Parekh, D. Smith, J. Rantschler, S. Zhang, W. Donner, T. R. Lee, P. Ruchhoeft, D. Weller, and S. Khizroev, "Design and fabrication of high anisotropy nanoscale bit-patterned magnetic recording medium for data storage applications," ECS Trans., vol.25, pp. 249-258, 2007.
2. J. Shaw, W. Rippard, S. Russek, T. Reith, and C. Falco, "Origins of switching field distributions in perpendicular nanodot arrays," J. Appl. Phys., vol.101, 2007, 023909.
3. Y. Kitade, H. Komoriya, and T. Maruyama, "Patterned media fabricated by lithography and argon-ion milling," IEEE Trans. Magn., vol.40, no.4, pp. 2516-2518, Jul. 2004.
4. C. Haginoya, S. Heike, M. Itabashi, N. Nakamura, and K. Koike, "Magnetic nanoparticle array with perpendicular crystal magnetic anisotropy," J. Appl. Phys., vol.85, pp. 8327-8330, 1999.
5. T. Thomson, G. Hu, and B. D. Terris, "Intrinsic distribution of magnetic anisotropy in thin films probed by patterned nanostructures," Phys. Rev. Lett., vol.96, no.25, 2006, 257204.
6. J. W. Lau, R. D. McMichael, S.-H. Chung, J. O. Rantschler, V. Parekh, and D. Litvinov, "Microstructural origin of switching field distribution in patterned Co/Pd multilayer nanodots," Appl. Phys. Lett., vol.92, 2008, 012506.
7. V. Parekh, E. Chunsheng, D. Smith, A. Ruiz, J. C. Wolfe, P. Ruch- hoeft, E. Svedberg, S. Khizroev, and D. Litvinov, "Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications," Nanotechnology, vol.17, pp. 2079-2082, May 2006.
8. R. Kaesmaier, H. Loschner, G. Stengl, J. C. Wolfe, and P. Ruchhoeft, "Ion projection lithography: International development program," J. Vacuum Sci. Technol. B, vol.17, pp. 3091-3097, Nov.-Dec. 1999.
9. P. Ruchhoeft and J. C. Wolfe, "Determination of resist exposure parameters in helium ion beam lithography: Absorbed energy gradient, contrast, and critical dose," J. Vacuum Sci. Technol. B, vol.18, pp. 3177-3180, Nov.-Dec. 2000.
10. P. Ruchhoeft and J. C. Wolfe, "Ion beam aperture-array lithography," J. Vacuum Sci. Technol. B, vol.19, pp. 2529-2532, Nov.-Dec. 2001.
11. V. Parekh, A. Ruiz, P. Ruchhoeft, H. Nounu, D. Litvinov, and J. C. Wolfe, "Estimation of scattered particle exposure in ion beam aperture array lithography," J. Vacuum Sci. Technol. B, vol.24, pp. 2915-2919, 2006.
12. V. Parekh, E. Chunsheng, D. Smith, A. Ruiz, J. C. Wolfe, P. Ruchhoeft, E. Svedberg, S. Khizroev, and D. Litvinov, Nanotechnology, vol.17, pp. 2079-2082, 2006.
13. P. Ruchhoeft and J. C. Wolfe, J. Vacuum Sci. Technol. B, vol.19, pp. 2529-2532, 2001.
14. V. Parekh, D. Smith, C. E, J. Rantschler, S. Khizroev, and D. Litvinov, "He+ ion irradiation study of continuous and patterned Co/Pd multilayers," J. Appl. Phys., vol.101, 2007, 083904.
15. D. X. Chen, J. A. Brug, and R. B. Goldfarb, "Demagnetizing factors for cylinders," IEEE Trans. Magn., vol.27, no.4, pp. 3601-3619, Jul. 1991.
16. V. Parekh, D. Smith, C. S. E, J. Rantschler, S. Khizroev, and D. Litvinov, "He ion irradiation study of continuous and patterned Co/Pd multilayers," J. Appl. Phys., vol.101, no.8, pp. 083904.1-083904.4, Apr. 2007.