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Volumn , Issue , 2009, Pages

Through silicon via(TSV) defect/pinhole self test circuit for 3D-IC

Author keywords

[No Author keywords available]

Indexed keywords

ANALOG TEST; EMERGING TECHNOLOGIES; OXIDE DEPOSITION; SELF TEST; THROUGH-SILICON-VIA;

EID: 70549083734     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/3DIC.2009.5306569     Document Type: Conference Paper
Times cited : (78)

References (4)
  • 1
    • 61649092607 scopus 로고    scopus 로고
    • Andry, P. S., C. K. Tsang, B. C. Webb, E. J. Sprogis, S. L. Wright, B. Dang, and D. G. Manzer. 2008. Fabrication and characterization of robust through-silicon vias for silicon-carrier applications. IBM Journal of Research & Development 52, no. 6: 571-581. Computers & Applied Sciences Complete, EBSCOhost (accessed May 18, 2009)
    • Andry, P. S., C. K. Tsang, B. C. Webb, E. J. Sprogis, S. L. Wright, B. Dang, and D. G. Manzer. 2008. "Fabrication and characterization of robust through-silicon vias for silicon-carrier applications." IBM Journal of Research & Development 52, no. 6: 571-581. Computers & Applied Sciences Complete, EBSCOhost (accessed May 18, 2009)
  • 2
    • 66249122055 scopus 로고    scopus 로고
    • Eaton, B., Kumar, A., Pamarthy, S., Deep silicon etch for TSVs with improved via profile/process control, Solid State Technology; Apr2009, 52 Issue 4, p22-25, 3p.
    • Eaton, B., Kumar, A., Pamarthy, S., "Deep silicon etch for TSVs with improved via profile/process control," Solid State Technology; Apr2009, Vol. 52 Issue 4, p22-25, 3p.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.