Use of multiple DC magnetron deposition sources for uniform coating of large areas

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7409, Issue , 2009, Pages

  Reicher, David W ^a   Christian, Roberto ^a   Davidson, Patrick ^a   Peplinski, Stanley Z ^b  

^a S Systems Corporation   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

Dc magnetron sputtering; Film uniformity; Niobium pentoxide; Optical coatings; Silicon dioxide

Indexed keywords

DC MAGNETRON SPUTTERING; DEPOSITION SYSTEMS; MAGNETRON DEPOSITION; MATERIAL DISTRIBUTION; MULTIPLE SOURCE; NIOBIUM PENTOXIDE; PROCESS YIELD; SILICON DIOXIDE; SYSTEM MAINTENANCE; UNIFORM COATING; UNIQUE FEATURES;

DEPOSITION RATES; NIOBIUM; OPTICAL COATINGS; OPTICAL MATERIALS; PHYSICAL VAPOR DEPOSITION; SILICA; THIN FILM DEVICES; THIN FILMS;

MAGNETRONS;

EID: 70449652148     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824882     Document Type: Conference Paper

References (8)

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