In situ Raman spectroscopy studies of the electrolyte-substrate interface during electrodeposition of silicon in a room-temperature ionic liquid

ECS Transactions

Volumn 16, Issue 24, 2009, Pages 1-6

  Nishimura, Yusaku ^a   Fukunaka, Yasuhiro ^a   Miranda, Caetano Rodrigues ^a   Nishida, Tetsuo ^a   Nohira, Toshiyuki ^a   Hagiwara, Rika ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; DISPROPORTIONATION REACTIONS; ELECTROCHEMICAL REDUCTIONS; IN-SITU; IN-SITU RAMAN SPECTROSCOPY; INCUBATION PERIODS; ROOM TEMPERATURE IONIC LIQUIDS; SI-SI BONDS; SILICON CHLORIDE; SUBSTRATE INTERFACE; TRIMETHYL;

CHLORINE COMPOUNDS; ELECTROLYTIC REDUCTION; IONIC LIQUIDS; IONIZATION OF LIQUIDS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SULFUR COMPOUNDS;

AMORPHOUS SILICON;

EID: 70449637819     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3109625     Document Type: Conference Paper

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