XPS study and optical properties of Si films electrodeposited in a room-temperature ionic liquid

ECS Transactions

Volumn 13, Issue 10, 2008, Pages 37-52

  Nishimura, Yusaku ^a   Fukunaka, Yasuhiro ^a   Nohira, Toshiyuki ^a   Goto, Takuya ^a   Hachiya, Kan ^a   Nishida, Tetsuo ^a   Hagiwara, Rika ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; ELECTRODES; ENERGY GAP; ETCHING; IONIC LIQUIDS; OPTICAL PROPERTIES; PHOTONS; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS SI; ANGLE-RESOLVED XPS; BINDING STATE; ELECTRODEPOSITED FILMS; PHOTOLUMINESCENCE MEASUREMENTS; PHOTON ENERGY; ROOM TEMPERATURE IONIC LIQUIDS; SPECTRUM SHAPE;

AMORPHOUS SILICON;

EID: 67649285771     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3005181     Document Type: Conference Paper

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