Mechanical characterization of thin amorphous tungsten-carbon (W x Cy) films prepared by DC-cosputtering

Vacuum

Volumn 76, Issue 2-3, 2004, Pages 173-176

  Macias, A Hurtado ^a   Gonzalez Hernandez J ^a   Saldaña, J Muñoz ^a   Herrera Fierro, P ^b   Garcia Jimenez P ^a   Beltrán, F J Espinoza ^a   Scholz, T ^c   Schneider, G A ^c  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

^b Energy Conversion Devices Inc   (United States)

^c HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Amorphous coatings; Chemical composition; Hardness; Nanoindentation

Indexed keywords

AMORPHOUS MATERIALS; AUGER ELECTRON SPECTROSCOPY; COMPOSITION; HARDNESS; INDENTATION; NANOSTRUCTURED MATERIALS; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

AMORPHOUS COATINGS; NANOINDENTATION; UNHEATED SUBSTRATES;

METALLIC FILMS;

EID: 7044247414     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.07.006     Document Type: Conference Paper

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