SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 320, Issue 2, 1998, Pages 192-197

Tungsten-carbon films prepared by reactive sputtering from argon-benzene discharges

(5) Radic N a Grzeta B a Milat, O b Ivkov, J b Stubicar M c

a RUDER BO KOVI INSTITUTE (Croatia)

b INSTITUTE OF PHYSICS (Croatia)

c UNIVERSITY OF ZAGREB (Croatia)

Author keywords

Benzene; Carbon; Sputtering; Tungsten

Indexed keywords

ARGON; BENZENE; ELECTRIC CONDUCTIVITY OF SOLIDS; GLASS; HARDNESS; MAGNETRON SPUTTERING; METABOLISM; SILICON; SPUTTER DEPOSITION; STAINLESS STEEL; THIN FILMS; TUNGSTEN CARBIDE;

REACTIVE ION SPUTTERING;

PROTECTIVE COATINGS;

EID: 0032073095 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00758-X Document Type: Article

Times cited : (34)

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