Predicting variability in nanoscale lithography processes

Proceedings - Design Automation Conference

Volumn , Issue , 2009, Pages 545-550

  Drmanac, Dragoljub Gagi ^a   Liu, Frank ^b   Wang, Li C ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b IBM   (United States)

Author keywords

Kernel methods; Machine learning; Modeling variability; Photo lithography; Process variation

Indexed keywords

COMPUTER AIDED DESIGN; LEARNING SYSTEMS; MACHINE LEARNING; SUPPORT VECTOR MACHINES;

KERNEL METHODS; LITHOGRAPHY PROCESS; LITHOGRAPHY SIMULATION; MACHINE LEARNING TECHNIQUES; MODELING VARIABILITY; NANOSCALE LITHOGRAPHY; PROCESS VARIATION; SUPPORT VECTOR MACHINE ALGORITHM;

LITHOGRAPHY;

EID: 70350736254     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1629911.1630053     Document Type: Conference Paper

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