-
1
-
-
0002189608
-
Critical dimension metrology and the scanning electron microscope
-
Postek M T and Vladar A E 2001 Critical dimension metrology and the scanning electron microscope Handbook of Silicon Semiconductor Metrology ed A C Diebold (New York/Basel: Dekker) pp 295-333
-
(2001)
Handbook of Silicon Semiconductor Metrology
, pp. 295-333
-
-
Postek, M.T.1
Vladar, A.E.2
-
2
-
-
0000366291
-
Proposal for a new submicron dimension reference for an electron beam metrology system
-
Nakayama Y, Okazaki S and Sugimoto A 1988 Proposal for a new submicron dimension reference for an electron beam metrology system J. Vac. Sci. Technol. B 6 1930-3
-
(1988)
J. Vac. Sci. Technol.
, vol.6
, Issue.6
, pp. 1930-1933
-
-
Nakayama, Y.1
Okazaki, S.2
Sugimoto, A.3
-
3
-
-
4243142926
-
Measurements of submicron pattern features on solid surfaces with a scanning electron microscope: 2. New concept of scanning electron microscope-based metrology (a review)
-
Novikov Yu A and Rakov A V 1996 Measurements of submicron pattern features on solid surfaces with a scanning electron microscope: 2. New concept of scanning electron microscope-based metrology (a review) Russ. Microelectron. 25 375-83
-
(1996)
Russ. Microelectron.
, vol.25
, pp. 375-383
-
-
Novikov Yu, A.1
Rakov, A.V.2
-
4
-
-
0029327416
-
Metrology of atomic force microscopy for Si nano-structures
-
Nagase M, Namatsu H, Kurihara K, Iwadate K and Murase K 1995 Metrology of atomic force microscopy for Si nano-structures Japan. J. Appl. Phys. 34 3382-7
-
(1995)
Japan. J. Appl. Phys.
, vol.34
, Issue.PART 1
, pp. 3382-3387
-
-
Nagase, M.1
Namatsu, H.2
Kurihara, K.3
Iwadate, K.4
Murase, K.5
-
5
-
-
0346388452
-
Linear standard for SEM-AFM microelectronics dimensional metrology in the range 0.01-100 νm
-
Volk Ch P, Gornev E S, Novikov Yu A, Ozerin Yu V, Plotnikov Yu I, Prokhorov A M and Rakov A V 2002 Linear standard for SEM-AFM microelectronics dimensional metrology in the range 0.01-100 νm Russ. Microelectron. 31 207-23
-
(2002)
Russ. Microelectron.
, vol.31
, Issue.4
, pp. 207-223
-
-
Volk Ch, P.1
Gornev, E.S.2
Novikov Yu, A.3
Ozerin Yu, V.4
Plotnikov Yu, I.5
Prokhorov, A.M.6
Rakov, A.V.7
-
7
-
-
0024958201
-
Scanning electron microscope-based metrological electron microscope system and new prototype scanning electron microscope magnification standard
-
Postek M T 1989 Scanning electron microscope-based metrological electron microscope system and new prototype scanning electron microscope magnification standard Scanning Microsc. 3 1087-99
-
(1989)
Scanning Microsc.
, vol.3
, Issue.4
, pp. 1087-1099
-
-
Postek, M.T.1
-
8
-
-
0032114902
-
An electron optical metrology system for pattern placement measurements
-
Haessler-Grohne W and Bosse H 1998 An electron optical metrology system for pattern placement measurements Meas. Sci. Technol. 9 1120-8
-
(1998)
Meas. Sci. Technol.
, vol.9
, Issue.7
, pp. 1120-1128
-
-
Haessler-Grohne, W.1
Bosse, H.2
-
9
-
-
0033644943
-
Mechanisms of secondary electron emission from the relief surface of a solid
-
Novikov Yu A and Rakov A V 2000 Mechanisms of secondary electron emission from the relief surface of a solid Surf. Invest. 15 1177-94
-
(2000)
Surf. Invest.
, vol.15
, pp. 1177-1194
-
-
Novikov Yu, A.1
Rakov, A.V.2
-
10
-
-
34247195636
-
Nanoscale surface measurements at sidewalls of nano- and micro-structures
-
Dai G, Wolff H, Weimann T, Xu Min, Pohlenz F and Danzebrink H-U 2007 Nanoscale surface measurements at sidewalls of nano- and micro-structures Meas. Sci. Technol. 18 334-41
-
(2007)
Meas. Sci. Technol.
, vol.18
, Issue.2
, pp. 334-341
-
-
Dai, G.1
Wolff, H.2
Weimann, T.3
Min, X.4
Pohlenz, F.5
Danzebrink, H.-U.6
|