Method for linear measurements in the nanometre range

Measurement Science and Technology

Volumn 18, Issue 2, 2007, Pages 367-374

  Novikov, Yu A ^a   Ozerin, Yu V ^b   Rakov, A V ^a   Todua, P A ^c  

^a PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

^b Mikron Corporation   (Russian Federation)

^c Center for Surface and Vacuum Research   (Russian Federation)

Author keywords

Atomic force microscope; Calibration; Linear measurements; Linewidth size measurement; Reference standard; Scanning electron microscope

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; IODINE; MOLECULAR STRUCTURE; SCANNING ELECTRON MICROSCOPY;

LINEAR MEASUREMENTS; LINEWIDTH SIZE MEASUREMENT; REFERENCE STANDARD;

MEASUREMENT THEORY;

ATOMIC FORCE MICROSCOPY; CALIBRATION; IODINE; MEASUREMENT THEORY; MOLECULAR STRUCTURE; SCANNING ELECTRON MICROSCOPY;

EID: 34247261104     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/18/2/S07     Document Type: Conference Paper

References (19)

1. The National Technology Roadmap for Semiconductors 1994 SIA San Jose, California, USA. 168 p
2. International Technology Roadmap for Semiconductors 2003 Edition, Metrology. http://public.itrs.net.
3. Postek M T, Vladar A E, Jones S N and Keery W J 1993 Interlaboratory study on the lithographically produced scanning electron microscope magnification standard prototype J. Res. Natl Inst. Stand. Technol. 98 447-67
4. Postek M T 1994 Critical issues in scanning electron microscope metrology J. Res. Natl Inst. Stand. Technol. 99 641-71
5. Novikov Yu A and Rakov A V 1996 Measurements of submicron pattern features on solid surfaces with a scanning electron microscope: 1. Instruments and methods (a review) Russ. Microelectron. 25 368-74
6. Postek M T, Vladar A E and Villarrubia J S 2000 Is a production level scanning electron microscope linewidth standard possible? Proc. SPIE 3998 42-56
7. Nakayama Y, Okazaki S and Sugimoto A 1988 Proposal for a new submicron dimension reference for an electron beam metrology system J. Vac. Sci. Technol. B 6 1930-3
8. Mirande W and Frase C G 1999 Comparison of linewidth measurements on Si structures performed by atomic force microscopy (AFM) and low voltage scanning electron microscopy (SEM) Proc. Quantitative Microscopy p 89
9. Volk Ch P, Gornev E S, Novikov Yu A, Ozerin Yu V, Plotnikov Yu I, Prokhorov A M and Rakov A V 2002 Linear standard for SEM-AFM microelectronics dimensional metrology in the range 0.01-100 νm Russ. Microelectron. 31 207-23
10. Gornev E S, Novikov Yu A, Rakov A V and Volk Ch P 2002 Geometric characteristics of the SEM electron probe Preprint GPI RAS, No 5 56 p
11. Postek M T 1989 Scanning electron microscope-based metrological electron microscope system and new prototype scanning electron microscope magnification standard Scanning Microsc. 3 1087-99
12. Haessler-Grohne W and Bosse H 1998 An electron optical metrology system for pattern placement measurements Meas. Sci. Technol. 9 1120-8
13. Kalendin V V, Chernyakov V N, Todua P A and Zhelkovaev Zh 1997 Etalon interferometer comparator for 3D measurements of surface topography, based on the scanning tunnel and atomic force microscopes Proc. 9th Int. Precision Engineering Seminar (Standtchalle, Germany) pp 138-9
14. Dai G, Koenders L, Pohlenz F, Dziomba T and Danzebrink H-U 2005 Accurate and traceable calibration of one-dimensional gratings Meas. Sci. Technol. 16 1241-9
15. Misumi I, Gonda S, Huang Q, Keem T, Kurosawa T, Fujii A, Hisata N, Yamagishi T, Fujimoto H, Enjoji K, Aya S and Sumitani H 2005 Sub-hundred nanometre pitch measurements using an AFM with differential laser interferometers for designing usable lateral scales Meas. Sci. Technol. 16 2080
16. Bosse H and Wilkening G 2005 Developments at PTB in nanometrology for support of the semiconductor industry Meas. Sci. Technol. 16 2155-66
17. Novikov Yu A and Rakov A V 1996 Measurements of submicron pattern features on solid surfaces with a scanning electron microscope: 2. New concept of scanning electron microscope-based metrology (a review) Russ. Microelectron. 25 375-83
18. Novikov Yu A, Rakov A V and Filippov M N 2004 Determination of the beam current dependence of SEM electron probe diameter Izmer. Tekh. (5) 13-5
19. Volk Ch P, Gornev E S, Novikov Yu A, Ozerin Yu V, Plotnikov Yu I and Rakov A V 2004 Scanning electron microscope measurements of microstructure element linear sizes over a wide range of magnifications Mikroelektronika 33 419-28