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Volumn 37, Issue 6, 2008, Pages 390-409

Geometric aspects of AFM imaging

Author keywords

[No Author keywords available]

Indexed keywords

MICROSCOPIC EXAMINATION;

EID: 55849114099     PISSN: 10637397     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063739708060061     Document Type: Article
Times cited : (6)

References (22)
  • 1
    • 0000006242 scopus 로고
    • Scanning Tunneling Microscopy
    • 6
    • G. Binnig H. Rohrer 1982 Scanning Tunneling Microscopy Helv. Phys. Acta 55 6 726 735
    • (1982) Helv. Phys. Acta , vol.55 , pp. 726-735
    • Binnig, G.1    Rohrer, H.2
  • 3
    • 0001488961 scopus 로고
    • Fabrication of Si Nanostructures with an Atomic Force Microscopy
    • 15
    • E.S. Snow P.M. Campbell 1994 Fabrication of Si Nanostructures with an Atomic Force Microscopy Appl. Phys. Lett. 64 15 1932 1934
    • (1994) Appl. Phys. Lett. , vol.64 , pp. 1932-1934
    • Snow, E.S.1    Campbell, P.M.2
  • 5
    • 3342918592 scopus 로고    scopus 로고
    • Atomic Force Microscopy for Metrology of Micro-and Nanostructures
    • 3. [Russ. Microelectron. (Engl. Transl.), vol. 26, no. 3, pp. 137-148]
    • A.A. Bukharaev N.V. Berdunov D.V. Ovchinnikov K.M. Salikhov 1997 Atomic Force Microscopy for Metrology of Micro-and Nanostructures Mikroelektronika 26 3 163 175 [Russ. Microelectron. (Engl. Transl.), vol. 26, no. 3, pp. 137-148]
    • (1997) Mikroelektronika , vol.26 , pp. 163-175
    • Bukharaev, A.A.1    Berdunov, N.V.2    Ovchinnikov, D.V.3    Salikhov, K.M.4
  • 6
    • 1542283918 scopus 로고    scopus 로고
    • Scanning Probe (Tunneling and Force) Microscopy in Metrological Problems of Nanoelectronics
    • 6. [Russ. Microelectron. (Engl. Transl.), vol. 26, no. 6, pp. 365-377]
    • P.A. Arutyunov A.L. Tolstikhina 1997 Scanning Probe (Tunneling and Force) Microscopy in Metrological Problems of Nanoelectronics Mikroelektronika 26 6 426 439 [Russ. Microelectron. (Engl. Transl.), vol. 26, no. 6, pp. 365-377]
    • (1997) Mikroelektronika , vol.26 , pp. 426-439
    • Arutyunov, P.A.1    Tolstikhina, A.L.2
  • 7
    • 0002110188 scopus 로고    scopus 로고
    • Etalon interferometric comparator for 3D measurements of surface topography, based on the scanning tunnel and atomic force microscopes
    • Braunschweig
    • Kalendin, V.V., Chernyakov, V.N., Todua, P.A., and Zhelkovaev, Zh., Etalon Interferometric Comparator for 3D Measurements of Surface Topography, Based on the Scanning Tunnel and Atomic Force Microscopes, in Proc. 9th Int. Precision Engineering Seminar (Braunschweig, 1997), pp. 138-139.
    • (1997) Proc. 9th Int. Precision Engineering Seminar , pp. 138-139
    • Kalendin, V.V.1    Chernyakov, V.N.2    Todua, P.A.3    Zhelkovaev, Zh.4
  • 8
    • 0347868638 scopus 로고    scopus 로고
    • Atomic Force Microscopy for Fabricating Micro-and Nanoelectronic Devices. Part 1
    • 6. [Russ. Microelectron. (Engl. Transl.), vol. 28, no. 6, pp. 346-354]
    • P.A. Arutyunov A.L. Tolstikhina 1999 Atomic Force Microscopy for Fabricating Micro-and Nanoelectronic Devices. Part 1 Mikroelektronika 28 6 405 414 [Russ. Microelectron. (Engl. Transl.), vol. 28, no. 6, pp. 346-354]
    • (1999) Mikroelektronika , vol.28 , pp. 405-414
    • Arutyunov, P.A.1    Tolstikhina, A.L.2
  • 9
  • 12
    • 55849127699 scopus 로고    scopus 로고
    • BINOM Moscow (Introduction to Nanotechnology)
    • Kobayasi, N., Vvedenie v nanotekhnologiyu (Introduction to Nanotechnology), Moscow: BINOM, 2005.
    • (2005) Vvedenie v Nanotekhnologiyu
    • Kobayasi, N.1
  • 13
    • 0345842246 scopus 로고    scopus 로고
    • Calibration of SEMs against a period linear standard for the micrometer and submicrometer regions
    • Volk, Ch.P., Novikov, Yu.A., and Rakov, A.V., Calibration of SEMs against a Period Linear Standard for the Micrometer and Submicrometer Regions, Izm. Tekh., 2000, no. 4, pp. 48-52.
    • (2000) Izm. Tekh. , Issue.4 , pp. 48-52
    • Volk, Ch.P.1    Novikov, Yu.A.2    Rakov, A.V.3
  • 14
    • 0036420617 scopus 로고    scopus 로고
    • Linear Standard for SEM-AFM Microelectronics Dimensional Metrology in the Range 0.01-100 μm
    • 4. [Russ. Microelectron. (Engl. Transl.), vol. 31, no. 4, pp. 207-223]
    • Ch.P. Volk E.S. Gornev Yu.A. Novikov Yu.V. Ozerin Yu.I. Plotnikov A.M. Prokhorov A.V. Rakov 2002 Linear Standard for SEM-AFM Microelectronics Dimensional Metrology in the Range 0.01-100 μm Mikroelektronika 31 4 243 262 [Russ. Microelectron. (Engl. Transl.), vol. 31, no. 4, pp. 207-223]
    • (2002) Mikroelektronika , vol.31 , pp. 243-262
    • Volk, Ch.P.1    Gornev, E.S.2    Novikov, Yu.A.3    Ozerin, Yu.V.4    Plotnikov, Yu.I.5    Prokhorov, A.M.6    Rakov, A.V.7
  • 16
    • 0242669233 scopus 로고    scopus 로고
    • Defining the Parameters of a Cantilever Tip AFM by Reference Structure
    • V.A. Bykov Yu.A. Novikov A.V. Rakov S.M. Shikin 2003 Defining the Parameters of a Cantilever Tip AFM by Reference Structure Ultramicroscopy 96 175 180
    • (2003) Ultramicroscopy , vol.96 , pp. 175-180
    • Bykov, V.A.1    Novikov, Yu.A.2    Rakov, A.V.3    Shikin, S.M.4
  • 18
    • 0000919922 scopus 로고
    • Ellipsometry Used for the Determination of Optical Properties of Silicon and Films of Its Native Oxide: The Accuracy of the Method
    • Yu.A. Novikov S.V. Peshekhonov 1995 Ellipsometry Used for the Determination of Optical Properties of Silicon and Films of Its Native Oxide: The Accuracy of the Method Tr. IOFAN 49 107 118
    • (1995) Tr. IOFAN , vol.49 , pp. 107-118
    • Novikov, Yu.A.1    Peshekhonov, S.V.2
  • 20
    • 0032114902 scopus 로고    scopus 로고
    • An Electron Optical Metrology System for Pattern Placement Measurements
    • 7
    • W. Haessler-Grohne H. Bosse 1998 An Electron Optical Metrology System for Pattern Placement Measurements Meas. Sci. Technol. 9 7 1120 1128
    • (1998) Meas. Sci. Technol. , vol.9 , pp. 1120-1128
    • Haessler-Grohne, W.1    Bosse, H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.