Growth of aligned multiwalled carbon nanotubes copper substrates by chemical vapor deposition

Journal of Materials Research

Volumn 24, Issue 9, 2009, Pages 2813-2820

  Li, Ge ^a   Chakrabarti, Supriya ^a   Schulz, Mark ^b   Shanov, Vesselin ^a  

^a UNIVERSITY OF CINCINNATI   (United States)

^b University of Cincinnati   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION OF; COPPER SUBSTRATES; COPPER SURFACE; DEPOSITION TEMPERATURES; INTERMEDIATE LAYERS; MICRO RAMAN SPECTROSCOPY; REACTION PARAMETERS; SCANNING ELECTRONS; THERMAL CHEMICAL VAPOR DEPOSITION; VERTICAL ALIGNMENT; VERTICALLY ALIGNED CARBON NANOTUBE;

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; CHROMIUM; COPPER; ETHYLENE; MULTIWALLED CARBON NANOTUBES (MWCN); RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; WATER VAPOR; WAVEGUIDES;

SUBSTRATES;

EID: 70350180145     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2009.0339     Document Type: Article

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