Preparation and characteristics of thermal resistance polysiloxane/Al composite coatings with low infrared emissivity

Journal of Alloys and Compounds

Volumn 486, Issue 1-2, 2009, Pages 371-375

  Hu, Chen ^a   Xu, Guoyue ^a   Shen, Xingmei ^a  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

Author keywords

Light absorption and reflection; Liquid quenching; Polymers; Scanning electron microscopy

Indexed keywords

AL POWDER; CHEMICAL COMPOSITIONS; COATING THICKNESS; EMISSIVITY VALUES; INFRARED EMISSIVITY; LIGHT ABSORPTION AND REFLECTION; LIQUID QUENCHING; POLYSILOXANES; SATURATION VALUES; SOLIDIFICATION TEMPERATURE; SURFACE MICROSTRUCTURES; THERMAL AGEING; THERMAL RESISTANCE; THERMAL SHOCK RESISTANCE; THERMAL STABILITY; THERMAL STABILITY STUDIES;

ABSORPTION; ALUMINA; ALUMINUM POWDER METALLURGY; CHEMICAL STABILITY; CRYSTALLIZATION; ELECTROMAGNETIC WAVE EMISSION; LIGHT ABSORPTION; LIGHT REFLECTION; LIQUIDS; PLASTIC COATINGS; POWDERS; QUENCHING; SCANNING ELECTRON MICROSCOPY; SILICONES; SOLIDIFICATION; THERMODYNAMIC STABILITY; THICKNESS MEASUREMENT;

COMPOSITE COATINGS;

EID: 70350105147     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.06.151     Document Type: Article

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