Different aspect ratio pyramidal tips obtained by wet etching of (100) and (111) silicon

Microelectronics Journal

Volumn 34, Issue 5-8, 2003, Pages 591-593

  Resnik, D ^a   Vrtacnik, D ^a   Aljancic, U ^a   Mozek, M ^a   Amon, S ^a  

^a UNIVERSITY OF LJUBLJANA   (Slovenia)

Author keywords

Pyramidal tips; Silicon; Wet etching

Indexed keywords

ANISOTROPY; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; ETCHING; MICROELECTRONICS; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; THERMOOXIDATION;

WET CHEMICAL ETCHING;

SILICON;

EID: 0038581561     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(03)00056-9     Document Type: Conference Paper

References (3)

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2. Wolter O., Bayer T., Creschner J. Micromachined silicon sensors for scanning force microscopy. J. Vac. Sci. Technol., B. 9:(2):1991;1353-1357.
3. Kong L., Orr B.G., Wise K.D. Integrated electrostatically resonant scan tip for an atomic force microscope. J. Vac. Sci. Technol., B. 11:(3):1993;634-641.