-
1
-
-
0031221057
-
SU-8: A low-cost negative resist for MEMS
-
Lorenz H, Despont M, Fahrnl N, LaBianca N, Renaud P and Vettiger P 1997 SU-8: a low-cost negative resist for MEMS J. Micromech. Microeng. 7 121-4
-
(1997)
J. Micromech. Microeng.
, vol.7
, pp. 121-4
-
-
Lorenz, H.1
Despont, M.2
Fahrnl, N.3
Labianca, N.4
Renaud, P.5
Vettiger, P.6
-
2
-
-
70349971260
-
-
http://www.microchem.com/products/su-eight.htm
-
-
-
-
3
-
-
0030646206
-
Negative photoresists for optical lithography
-
Shaw J M, Gelorme J D, LaBianca N C, Conley W E and Holmes S J 1997 Negative photoresists for optical lithography IBM J. Res. Dev. 41 81
-
(1997)
IBM J. Res. Dev.
, vol.41
, Issue.1-2
, pp. 81
-
-
Shaw, J.M.1
Gelorme, J.D.2
Labianca, N.C.3
Conley, W.E.4
Holmes, S.J.5
-
4
-
-
0036643859
-
Removal of SU-8 photoresist for thick film applications
-
Dentinger P M, Clift W M and Goods S H 2002 Removal of SU-8 photoresist for thick film applications Microelectron. Eng. 61-62 993-1000
-
(2002)
Microelectron. Eng.
, vol.61-62
, pp. 993-1000
-
-
Dentinger, P.M.1
Clift, W.M.2
Goods, S.H.3
-
5
-
-
33748368688
-
Study of SU-8 to make a Ni master-mold: Adhesion, sidewall profile, and removal
-
Kim S J, Yang H, Kim K, Lim Y T and Pyo H B 2006 Study of SU-8 to make a Ni master-mold: adhesion, sidewall profile, and removal Electrophoresis 27 3284-96
-
(2006)
Electrophoresis
, vol.27
, Issue.16
, pp. 3284-3296
-
-
Kim, S.J.1
Yang, H.2
Kim, K.3
Lim, Y.T.4
Pyo, H.B.5
-
6
-
-
42549101710
-
Fabrication of thick electroforming micro mould using a KMPR negative tone photoresist
-
Lee C H and Jiang K 2008 Fabrication of thick electroforming micro mould using a KMPR negative tone photoresist J. Micromech. Microeng. 18 055032-8
-
(2008)
J. Micromech. Microeng.
, vol.18
, Issue.5
, pp. 055032-055038
-
-
Lee, C.H.1
Jiang, K.2
-
7
-
-
33750577829
-
An all SU-8 microfluidic chip with built-in 3D fine microstructures
-
Sato H, Matsumura H, Keino H S and Shoji S 2006 An all SU-8 microfluidic chip with built-in 3D fine microstructures J. Micromech. Microeng. 16 2318-22
-
(2006)
J. Micromech. Microeng.
, vol.16
, Issue.11
, pp. 2318-2322
-
-
Sato, H.1
Matsumura, H.2
Keino, H.S.3
Shoji, S.4
-
8
-
-
34249675900
-
SU-8: A photoresist for high-aspect-ratio and 3D submicron lithography
-
del Campo A and Greiner C 2007 SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography J. Micromech. Microeng. 17 R81-95
-
(2007)
J. Micromech. Microeng.
, vol.17
, Issue.6
-
-
Del Campo, A.1
Greiner, C.2
-
9
-
-
0031685672
-
Mechanical characterization of a new high-aspect-ratio near UV-photoresist
-
Lorenz H, Laudon M and Renaud P 1998 Mechanical characterization of a new high-aspect-ratio near UV-photoresist Microelectron. Eng. 41-42 371-4
-
(1998)
Microelectron. Eng.
, vol.41-42
, pp. 371-374
-
-
Lorenz, H.1
Laudon, M.2
Renaud, P.3
-
10
-
-
0036646187
-
SU-8 thick photoresist processing as a functional material for MEMS applications
-
Conradie E H and Moore D F 2002 SU-8 thick photoresist processing as a functional material for MEMS applications J. Micromech. Microeng. 12 368-74
-
(2002)
J. Micromech. Microeng.
, vol.12
, Issue.4
, pp. 368-374
-
-
Conradie, E.H.1
Moore, D.F.2
-
11
-
-
33644928764
-
Fabrication of three-dimensional microstructures based on single-layered SU-8 for lab-on-chip applications
-
Yu H, Balogun O, Li B, Murray T W and Zhang X 2006 Fabrication of three-dimensional microstructures based on single-layered SU-8 for lab-on-chip applications Sensors Actuators A 127 228-34
-
(2006)
Sensors Actuators
, vol.127
, Issue.2
, pp. 228-234
-
-
Yu, H.1
Balogun, O.2
Li, B.3
Murray, T.W.4
Zhang, X.5
-
12
-
-
5644231008
-
On the radiation tolerance of SU-8, a new material for gaseous microstructure radiation detector fabrication
-
Key M J, Cindro V and Lozano M 2004 On the radiation tolerance of SU-8, a new material for gaseous microstructure radiation detector fabrication Radiat. Phys. Chem. 71 1003-7
-
(2004)
Radiat. Phys. Chem.
, vol.71
, Issue.5
, pp. 1003-1007
-
-
Key, M.J.1
Cindro, V.2
Lozano, M.3
-
13
-
-
44849130378
-
A radiation imaging detector made by postprocessing a standard CMOS chip
-
Blanco Carballo V M, Chefdeville M, van der Graaf H, Melai J, Salm C, Schmitz J and Timmermans J 2008 A radiation imaging detector made by postprocessing a standard CMOS chip IEEE Electron Dev. Lett. 29 585-7
-
(2008)
IEEE Electron Dev. Lett.
, vol.29
, Issue.6
, pp. 585-587
-
-
Blanco Carballo, V.M.1
Chefdeville, M.2
Van Der Graaf, H.3
Melai, J.4
Salm, C.5
Schmitz, J.6
Timmermans, J.7
-
14
-
-
70349967473
-
-
Melai J, Salm C, Smits S M, Blanco Carballo V M, Schmitz J and Hageluken B 2007 Proc. of the SAFE Workshop (Veldhoven, the Netherlands) (Veldhoven: STW) pp 529-34
-
(2007)
Proc. of the SAFE Workshop
, pp. 529-534
-
-
Melai, J.1
Salm, C.2
Smits, S.M.3
Blanco Carballo, V.M.4
Schmitz, J.5
Hageluken, B.6
-
15
-
-
34247574243
-
Study of crack formation in high-aspect ratio SU-8 structures on silicon
-
Bystrova S, Luttge R and van den Berg A 2007 Study of crack formation in high-aspect ratio SU-8 structures on silicon Microelectron. Eng. 84 1113-6
-
(2007)
Microelectron. Eng.
, vol.84
, Issue.5-8
, pp. 1113-1116
-
-
Bystrova, S.1
Luttge, R.2
Van Den Berg, A.3
-
16
-
-
34249991727
-
Remotely adjustable check-valves with an electrochemical release mechanism for implantable biomedical microsystems
-
Pan T, Baldi A and Ziaie B 2007 Remotely adjustable check-valves with an electrochemical release mechanism for implantable biomedical microsystems Biomed. Microdevices 9 385-94
-
(2007)
Biomed. Microdevices
, vol.9
, Issue.3
, pp. 385-394
-
-
Pan, T.1
Baldi, A.2
Ziaie, B.3
-
17
-
-
50249178159
-
Reliability aspects of a radiation detector fabricated by post-processing a standard CMOS chip
-
Salm C, Blanco Carballo V M, Melai J and Schmitz J 2008 Reliability aspects of a radiation detector fabricated by post-processing a standard CMOS chip Microelectron. Reliab. 48 1139-43
-
(2008)
Microelectron. Reliab.
, vol.48
, Issue.8-9
, pp. 1139-1143
-
-
Salm, C.1
Blanco Carballo, V.M.2
Melai, J.3
Schmitz, J.4
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