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Volumn 256, Issue 1, 2009, Pages 1-5
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Influence of deposition atmosphere on photocatalytic activity of TiO 2 /SiOx double-layers prepared by RF magnetron sputtering
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Author keywords
Photocatalytic activity; RF magnetron sputtering; SiO x; Thin films; TiO 2
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Indexed keywords
AROMATIC COMPOUNDS;
ATOMIC FORCE MICROSCOPY;
FILM PREPARATION;
MAGNETRON SPUTTERING;
PHOTOCATALYSIS;
SCANNING ELECTRON MICROSCOPY;
THIN FILMS;
TITANIUM DIOXIDE;
X RAY PHOTOELECTRON SPECTROSCOPY;
DEPOSITION ATMOSPHERE;
DOUBLE LAYERS;
ELECTRON-HOLE RECOMBINATION;
PHOTOCATALYTIC ACTIVITIES;
PHOTODEGRADATION OF METHYLENE BLUE;
RF-MAGNETRON SPUTTERING;
SIOX;
TIO2;
SILICON COMPOUNDS;
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EID: 70349761210
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2009.05.059 Document Type: Review |
Times cited : (35)
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References (19)
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