Growth strains in thermally grown Al2O3 scales studied using synchrotron radiation

JOM

Volumn 61, Issue 7, 2009, Pages 51-55

  Hou, P Y ^a   Paulikas, A P ^b   Veal, B W ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED PHOTON SOURCE; ALLOY COMPOSITIONS; ALUMINA THIN FILMS; ARGONNE NATIONAL LABORATORY; DYNAMIC NATURE; GROWTH STRAIN; HIGH TEMPERATURE ALLOYS; IN-SITU; MODEL ALLOYS; REACTIVE ELEMENTS; STRESS EVOLUTION; X-RAY TECHNIQUES;

ELECTROMAGNETIC WAVES; FILM GROWTH; HAFNIUM; SYNCHROTRON RADIATION; SYNCHROTRONS; ZIRCONIUM;

ALLOYS;

EID: 70349728580     PISSN: 10474838     EISSN: 15431851     Source Type: Journal    
DOI: 10.1007/s11837-009-0103-x     Document Type: Article

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