Growth strains and stress relaxation in alumina scales during high temperature oxidation

Materials Science Forum

Volumn 461-464, Issue II, 2004, Pages 671-680

  Hou, P Y ^a   Paulikas, A P ^b   Veal, B W ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Debye Sherrer diffraction; FeAl; FeCrAl; Growth stress; NiAl; Oxidation; Reactive element; Synchrotron radiation; X ray

Indexed keywords

COOLING; IRON COMPOUNDS; MICROSTRUCTURE; NICKEL COMPOUNDS; OXIDATION; SYNCHROTRON RADIATION; TENSILE STRESS; X RAYS;

AL2O3; DEBYE-SHERRER DIFFRACTION; FECRAL; GROWTH STRESS; NIAL; REACTIVE ELEMENT;

ALUMINUM COMPOUNDS;

EID: 8744233168     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.461-464.671     Document Type: Conference Paper

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