Strains in thermally growing alumina films measured in-situ using synchrotron X-rays

Materials Science Forum

Volumn 522-523, Issue , 2006, Pages 433-440

  Hou, P Y ^a   Paulikas, A P ^b   Veal, B W ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Al2O3; Cr2O3; Growth stress; Oxide creep; X ray diffraction

Indexed keywords

ALUMINA; OXIDATION; SYNCHROTRON RADIATION; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

ALUMINA FILMS; SYNCHROTRON X-RAYS;

OXIDE FILMS;

EID: 33750177840     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-409-x.433     Document Type: Conference Paper

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