-
2
-
-
47249096960
-
Wafer level packaging of MEMS
-
No. 073001
-
M. Esashi, " Wafer Level Packaging of MEMS", J. Micromech. Microeng., Vol. 18, No. 073001, pp. 1-13, 2008.
-
(2008)
J. Micromech. Microeng.
, vol.18
, pp. 1-13
-
-
Esashi, M.1
-
3
-
-
0348195814
-
GaAs on Si heterostructures obtained by he and/or H implantation and direct wafer bonding
-
I. Radu, I. Szafraniak, R. Scholz, M. Alexe, and U. Gö sele, " GaAs on Si Heterostructures Obtained by He and/or H Implantation and Direct Wafer Bonding", J. Appl. Phys., Vol. 94, pp. 7820-7825, 2002.
-
(2002)
J. Appl. Phys.
, vol.94
, pp. 7820-7825
-
-
Radu, I.1
Szafraniak, I.2
Scholz, R.3
Alexe, M.4
Gösele, U.5
-
4
-
-
33748533457
-
Three-dimensional integrated circuits
-
A. W. Pool et. al., " Three-dimensional Integrated Circuits", IBM J. Res. and Devel., Vol. 50, No. 4/5, pp. 491-506, 2006.
-
(2006)
IBM J. Res. and Devel.
, vol.50
, Issue.4-5
, pp. 491-506
-
-
Pool, A.W.1
-
5
-
-
70349681317
-
-
C. S. Tan, R. J. Gutmann, and L. R. Reif, Eds, (New York: Springer
-
C. S. Tan, R. J. Gutmann, and L. R. Reif, Eds, Wafer Level 3-D ICs Process Technology, (New York: Springer, 2008), pp. 59-63.
-
(2008)
Wafer Level 3-D ICs Process Technology
, pp. 59-63
-
-
-
6
-
-
33947423949
-
Wafer direct bonding: From advanced substrate engineering to future applications in micro/nanoelectronics
-
S. H. Christiansen, R. Singh, and U. Gö sele, " Wafer Direct Bonding: From Advanced Substrate Engineering to Future Applications in Micro/Nanoelectronics", Proc. IEEE, Vol. 94, No.12, pp. 2060-2106, 2006.
-
(2006)
Proc. IEEE
, vol.94
, Issue.12
, pp. 2060-2106
-
-
Christiansen, S.H.1
Singh, R.2
Gösele, U.3
-
7
-
-
0005057994
-
Moire patterns: Their application to refractive index and refractive index gradient measurements
-
Y. Nishijima, " Moire Patterns: Their Application to Refractive Index and Refractive Index Gradient Measurements", J. Opt. Soc. Am., Vol. 54, 1-8, 1964.
-
(1964)
J. Opt. Soc. Am.
, vol.54
, pp. 1-8
-
-
Nishijima, Y.1
-
8
-
-
84975625634
-
Moire patterns of skewed radial gratings
-
B. Sandler, E. Keren, A. Livnat and O. Kafri, " Moire Patterns of Skewed Radial Gratings", Appl. Opt., Vol. 26, 772-773, 1987.
-
(1987)
Appl. Opt.
, vol.26
, pp. 772-773
-
-
Sandler, B.1
Keren, E.2
Livnat, A.3
Kafri, O.4
-
9
-
-
0346562908
-
Moiré method and zone plate pattern inaccuracies
-
Y. Vladimirsky and H.W. Koops, " Moiré Method and Zone Plate Pattern Inaccuracies", J. Vac. Sci. Technol. B, Vol. 6, 2142-2146, 1988.
-
(1988)
J. Vac. Sci. Technol. B
, vol.6
, pp. 2142-2146
-
-
Vladimirsky, Y.1
Koops, H.W.2
-
10
-
-
0032136199
-
Moiré patterns of two different elongated circular gratings for the fine visual measurement of linear displacements
-
J. S. Song, Y. H. Lee, J. H. Jo, S. Chang and K. C. Yuk, " Moiré Patterns of Two Different Elongated Circular Gratings for the Fine Visual Measurement of Linear Displacements", Opt. Commun., Vol. 154, 100-108, 1998.
-
(1998)
Opt. Commun.
, vol.154
, pp. 100-108
-
-
Song, J.S.1
Lee, Y.H.2
Jo, J.H.3
Chang, S.4
Yuk, K.C.5
-
11
-
-
33846225236
-
Sub-20-nm alignment in nanoimprint lithography using moiré fringe
-
N. Li, W. Wu, and S.Y. Chou, " Sub-20-nm Alignment in Nanoimprint Lithography Using Moiré Fringe", Nano Lett., Vol. 6, No. 11, pp. 2626-2629, 2006.
-
(2006)
Nano Lett.
, vol.6
, Issue.11
, pp. 2626-2629
-
-
Li, N.1
Wu, W.2
Chou, S.Y.3
-
12
-
-
5544298270
-
Subnanometer alignment system for x-ray lithography
-
H. Zhou and M. Feldman, " Subnanometer Alignment System for X-ray Lithography", J. Vac. Sci. Technol. B, Vol.12, No.6, pp. 3261-3264, 1994.
-
(1994)
J. Vac. Sci. Technol. B
, vol.12
, Issue.6
, pp. 3261-3264
-
-
Zhou, H.1
Feldman, M.2
-
13
-
-
1342308266
-
Sensitive train measurements of bonded SOI films using moiré
-
M. Meinhold, J.-W. Jung and D. A. Antoniadis, " Sensitive Train Measurements of Bonded SOI Films Using Moiré ", IEEE Trans. Semicond. Manuf., Vol. 17, No. 1, 35-41, 2004.
-
(2004)
IEEE Trans. Semicond. Manuf.
, vol.17
, Issue.1
, pp. 35-41
-
-
Meinhold, M.1
Jung, J.-W.2
Antoniadis, D.A.3
-
14
-
-
0343823749
-
Novel on-axis interferometric alignment method with sub-10 nm precision
-
A. Moel, E. E. Moon, R. D. Frankel, and H. I. Smith, " Novel On-axis Interferometric Alignment Method with Sub-10 nm Precision", J. Vac. Sci. Technol. B, Vol.11, No.6, pp. 2191-2194, 1993.
-
(1993)
J. Vac. Sci. Technol. B
, vol.11
, Issue.6
, pp. 2191-2194
-
-
Moel, A.1
Moon, E.E.2
Frankel, R.D.3
Smith, H.I.4
-
15
-
-
34948882304
-
High-precision alignment and bonding system for the fabrication of 3-D nanostructures
-
S. Kawashima, M. Imada, K. Ishizaki and S. Noda, " High-Precision Alignment and Bonding System for the Fabrication of 3-D Nanostructures", J. Micro electromech. Syst., Vol. 16, No. 5, 1140-1144, 2007.
-
(2007)
J. Micro Electromech. Syst.
, vol.16
, Issue.5
, pp. 1140-1144
-
-
Kawashima, S.1
Imada, M.2
Ishizaki, K.3
Noda, S.4
|