Preparation of a SERS substrate and its sample-loading method for point-of-use application

Nanotechnology

Volumn 20, Issue 40, 2009, Pages

  Fang, C ^a   Agarwal, A ^a   Ji, H ^a   Karen, W Y ^a   Yobas, L ^a  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS DEPOSITION; CURVED SURFACES; DEPOSITION SOLUTION; FIELD APPLICATION; HYDROGEN FLUORIDE; POINT-OF-USE; SAMPLE SOLUTION; SELF-ASSEMBLED; SERS SUBSTRATE; SI NANOWIRE; SI WAFER; SILVER NITRATES; SIMPLE APPROACH;

HYDROFLUORIC ACID; HYDROGEN; MONOLAYERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SILVER; SURFACES;

SUBSTRATES;

NANOWIRE; SILICON; SILVER; SILVER NITRATE; HYDROFLUORIC ACID; METAL NANOPARTICLE;

ANALYTIC METHOD; ARTICLE; MAGNETIC FIELD; MORPHOLOGY; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SURFACE ENHANCED RAMAN SCATTERING; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; RAMAN SPECTROMETRY; ULTRASTRUCTURE;

HYDROFLUORIC ACID; METAL NANOPARTICLES; MICROSCOPY, ELECTRON, SCANNING; NANOTECHNOLOGY; SILVER; SILVER NITRATE; SPECTRUM ANALYSIS, RAMAN;

EID: 70349679145     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/40/405604     Document Type: Article

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