Towards optical-quality nanocrystalline diamond with reduced non-diamond content

Physica Status Solidi (A) Applications and Materials Science

Volumn 206, Issue 9, 2009, Pages 2004-2008

  Remes, Z ^a   Kromka, A ^a   Vanecek, M ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTANCE; CHEMICAL ETCHING; DUAL BEAM; FUSED SILICA SUBSTRATES; GROWTH CONDITIONS; LOW TEMPERATURES; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMONDS; NCD FILMS; NEAR INFRARED; NEAR-IR; OPTICAL ABSORPTION; OPTICAL RANGE; OPTICAL SCATTERING; ORDERS OF MAGNITUDE; PHOTOCURRENT SPECTROSCOPY; PHOTOCURRENT SPECTRUM; POST-DEPOSITION; SURFACE OXIDATIONS; SURFACE SCATTERING; UV ILLUMINATIONS; VISIBLE REGION;

ABSORPTION; CHEMICAL CLEANING; DIAMOND FILMS; DIAMONDS; INFRARED SPECTROSCOPY; LIGHT ABSORPTION; MICROWAVES; NANOCRYSTALLINE MATERIALS; PHOTOCURRENTS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA;

FUSED SILICA;

EID: 70349091851     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200982211     Document Type: Article

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