Fabrication and testing of freestanding Si nanogratings for UV filtration on space-based particle sensors

Nanotechnology

Volumn 20, Issue 32, 2009, Pages

  Mukherjee, Pran ^a,b   Zurbuchen, Thomas H ^a   Jay Guo, L ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BULK SILICON; DEEP REACTIVE ION ETCHING; DEVICE PERFORMANCE; FABRICATION PROCESS; HALF-PITCH GRATINGS; NANO-GRATINGS; OPTICAL CHARACTERIZATION; PARTICLE SENSORS; SILICON ON INSULATOR WAFERS; SPACE PLASMAS; SPACE-BASED; TRANSMISSION GRATINGS;

ALUMINA; ELECTRON BEAM LITHOGRAPHY; REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS;

SILICON WAFERS;

ALUMINUM; NANOMATERIAL; SILICON;

ARTICLE; BIOSENSOR; FILTRATION; GRATING; MECHANICS; PARTICLE SIZE; PRIORITY JOURNAL; STRENGTH; ULTRAVIOLET RADIATION;

EID: 70249147982     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/32/325301     Document Type: Article

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