Effects of oxygen-reducing atmosphere annealing on LaMnO3 epitaxial thin films

Journal of Physics D: Applied Physics

Volumn 42, Issue 16, 2009, Pages

  Choi, W S ^a   Marton, Z ^b   Jang, S Y ^a   Moon, S J ^a   Jeon, B C ^a   Shin, J H ^a   Seo, S S A ^b   Noh, T W ^a   Myung Whun, K ^c   Lee, H N ^b   Lee, Y S ^d  

^a Seoul National University   (South Korea)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c Chonbuk National University   (South Korea)

^d Soongsil University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETICS; AS-GROWN; BULK-LIKE; EFFICIENT METHOD; EPITAXIAL THIN FILMS; HETEROSTRUCTURES; INSULATING PHASIS; NON DESTRUCTIVE; OPTICAL SPECTROSCOPY; REDUCING ATMOSPHERE; ROOM TEMPERATURE;

ANNEALING; ANTIFERROMAGNETISM; DEPOSITION; OPTICAL PROPERTIES; OXYGEN; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; STOICHIOMETRY;

EPITAXIAL FILMS;

EID: 70249104698     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/16/165401     Document Type: Article

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