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Volumn , Issue , 2008, Pages
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High frequency characterisation of single inas nanowire field-effect transistors
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Author keywords
High frequency characterisation; InAs nanowire field effect transistor; Magnesium Oxide gate dielectric
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Indexed keywords
CARRIER SUBSTRATE;
CHARACTERISATION;
DE-EMBEDDING;
FIELD-EFFECT;
GATE SOURCE CAPACITANCE;
HIGH FREQUENCY;
HIGH FREQUENCY CHARACTERISATION;
INAS;
INAS NANOWIRE FIELD-EFFECT TRANSISTOR;
INAS NANOWIRE FIELD-EFFECT TRANSISTORS;
LOW FREQUENCY;
MAGNESIUM OXIDE GATE DIELECTRIC;
MAGNESIUM OXIDES;
MAXIMUM OSCILLATION FREQUENCY;
MAXIMUM STABLE GAIN;
NANOWIRE FET;
ON-WAFER;
SMALL SIGNAL;
ULTRA-SMALL;
COPLANAR WAVEGUIDES;
ELECTRIC WIRE;
GATE DIELECTRICS;
GATES (TRANSISTOR);
HETEROJUNCTION BIPOLAR TRANSISTORS;
INDIUM ARSENIDE;
INDIUM PHOSPHIDE;
MAGNESIUM;
NANOWIRES;
SCATTERING PARAMETERS;
SEMICONDUCTING INDIUM;
SILICON NITRIDE;
FIELD EFFECT TRANSISTORS;
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EID: 70149114001
PISSN: 10928669
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ICIPRM.2008.4703003 Document Type: Conference Paper |
Times cited : (4)
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References (5)
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