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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

Inspection and repair for imprint lithography at 32nm and below

(9) Selinidis, Kosta a Thompson, Ecron a Sreenivasan, S V a Resnick, Douglas J a Pritschow, Marcus b Butschke, Joerg b Irmscher, Mathias b Sailer, Holger b Dobberstein, Harald c

a MOLECULAR IMPRINTS INC (United States)

b Institut fur Mikroelektronik Stuttgart (Germany)

c CARL ZEISS SMT AG (Germany)

Author keywords

E beam repair; Electron beam inspection; Imprint lithography; Imprint mask; Mask repair; S FIL; Step and flash imprint lithography

Indexed keywords

E-BEAM REPAIR; ELECTRON BEAM INSPECTION; IMPRINT LITHOGRAPHY; IMPRINT MASK; MASK REPAIR; S-FIL; STEP AND FLASH IMPRINT LITHOGRAPHY;

CELL MEMBRANES; DEFECTS; ELECTRON BEAMS; INSPECTION; NANOIMPRINT LITHOGRAPHY; PHOTOMASKS; STATIC RANDOM ACCESS STORAGE; SUBSTRATES; SUPERCONDUCTING WIRE; ULTRAVIOLET RADIATION;

REPAIR;

EID: 69949179107 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.824264 Document Type: Conference Paper

Times cited : (4)

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