Actinic mask inspection using an extreme ultraviolet microscope

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Takase, Kei ^a   Kamaji, Yoshito ^a   Iguchi, Takafumi ^a   Sugiyama, Takashi ^b   Uno, Toshiyuki ^b   Harada, Tetsuo ^a   Watanabe, Takeo ^a   Kinoshita, Hiroo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b ASAHI GLASS CO LTD   (Japan)

Author keywords

EUVL; EUVM; Mask; Mask inspection; Phase defect

Indexed keywords

ACTINIC MASK INSPECTION; COATED SUBSTRATES; CRITICAL DIMENSION; DEEP HOLES; DEEP PIT; EUVL; EUVM; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET LITHOGRAPHY MASKS; MASK INSPECTION; PHASE DEFECT; PHASE DEFECTS; SCHWARZSCHILD OPTICS; SIMULATION RESULT; X-RAY ZOOMING TUBE;

INSPECTION; ULTRAVIOLET DEVICES;

DEFECTS;

EID: 69949118932     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824333     Document Type: Conference Paper

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