Morphology and growth of electrodeposited cuprous oxide under different values of direct current density

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 120-125

  Hu, F ^a   Chan, K C ^a   Yue, T M ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

Cuprous oxide; Direct current electrodeposition; Morphology; Scanning electron microscopy; X ray diffraction

Indexed keywords

ACID ELECTROLYTES; ALKALINE ELECTROLYTES; CLUSTER GROWTH; CUBIC SHAPE; CUPROUS OXIDE; DIRECT CURRENT; DIRECT CURRENT ELECTRODEPOSITION; ELECTROCRYSTALLIZATION; THREE ELECTRODE-SYSTEM; TWO-ELECTRODE SYSTEMS;

ACIDS; COPPER OXIDES; CORROSION; CRYSTAL GROWTH; DIFFRACTION; ELECTRODEPOSITION; ELECTROLYTES; GRAIN BOUNDARIES; MICROSTRUCTURE; MORPHOLOGY; SCANNING; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

COPPER;

EID: 69549088265     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.010     Document Type: Article

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