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Volumn 10, Issue 1, 2010, Pages 230-234
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The influence of moisture on atmospheric pressure plasma etching of PA6 films
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Author keywords
Atmospheric pressure plasma jet (APPJ); Moisture regain (MR); PA6 film; Relative humidity (RH); Surface analysis; XPS
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Indexed keywords
ATMOSPHERIC PRESSURE PLASMA JET (APPJ);
ATMOSPHERIC PRESSURE PLASMA JETS;
ATMOSPHERIC PRESSURE PLASMA TREATMENT;
ATMOSPHERIC PRESSURE PLASMAS;
CONTACT-ANGLE MEASUREMENTS;
ETCHING PROCESS;
ETCHING RATE;
FILM SURFACES;
PA6 FILM;
PLASMA GAS;
POLYAMIDE 6;
RELATIVE HUMIDITIES;
RELATIVE HUMIDITY (RH);
SUBSTRATE MATERIAL;
XPS;
ANGLE MEASUREMENT;
ATMOSPHERIC PRESSURE;
ATMOSPHERICS;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
HELIUM;
PHOTORESISTS;
PLASMA ACCELERATORS;
PLASMA APPLICATIONS;
PLASMA ETCHING;
PLASMA JETS;
PLASMA SOURCES;
REGAIN;
SURFACE ANALYSIS;
SURFACE ROUGHNESS;
SURFACES;
X RAY PHOTOELECTRON SPECTROSCOPY;
ATMOSPHERIC HUMIDITY;
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EID: 69249214007
PISSN: 15671739
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cap.2009.05.035 Document Type: Article |
Times cited : (12)
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References (20)
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