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Volumn 10, Issue 1, 2010, Pages 230-234

The influence of moisture on atmospheric pressure plasma etching of PA6 films

Author keywords

Atmospheric pressure plasma jet (APPJ); Moisture regain (MR); PA6 film; Relative humidity (RH); Surface analysis; XPS

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA JET (APPJ); ATMOSPHERIC PRESSURE PLASMA JETS; ATMOSPHERIC PRESSURE PLASMA TREATMENT; ATMOSPHERIC PRESSURE PLASMAS; CONTACT-ANGLE MEASUREMENTS; ETCHING PROCESS; ETCHING RATE; FILM SURFACES; PA6 FILM; PLASMA GAS; POLYAMIDE 6; RELATIVE HUMIDITIES; RELATIVE HUMIDITY (RH); SUBSTRATE MATERIAL; XPS;

EID: 69249214007     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2009.05.035     Document Type: Article
Times cited : (12)

References (20)
  • 12
    • 0035441099 scopus 로고    scopus 로고
    • S.G. Park, H.Y. Song, B.H. O, Journal of Vacuum Science and Technology B 19 (2001) 1841.
    • S.G. Park, H.Y. Song, B.H. O, Journal of Vacuum Science and Technology B 19 (2001) 1841.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.