Effect of time-varying axial magnetic field on photoresist ashing in an inductively coupled plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 5, 2001, Pages 1841-1844

  Park, Se Geun ^a   Song, Ho Young ^a   Jeong, Beom Hoan ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; MAGNETIC ANISOTROPY; MAGNETIC FIELD EFFECTS; PLASMA DENSITY; REACTIVE ION ETCHING; SILICA;

PHOTORESIST ASHING; TIME VARYING AXIAL MAGNETIC FIELDS;

PHOTORESISTORS;

EID: 0035441099     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1401746     Document Type: Article

References (16)

1. B.-H. O, J. Jeong, and S.-G. Park, Surf. Coat. Technol. 120-121, 752 (1999).
2. B.-H. O, S.-G. Park, S.-H. Rha, and J. Jeong, Surf. Coat. Technol. 133-134, 589 (2000).
3. S.-B. Cho, H.-Y. Song, S.-G. Park, and B.-H. O, J. Vac. Sci. Technol. B (accepted).
4. J. E. Stevens, M. J. Sowa, and J. L. Cecchi, J. Vac. Sci. Technol. A 13, 2476 (1995).
5. M. Murata, Y. Takeuchi, and S. Nishida, Vacuum 48, 1 (1997).
6. S. Wickramanayaka, Y. Nakagawa, Y. Sago, and Y. Numasawa, J. Vac. Sci. Technol. A 18, 823 (2000).
7. H. Lee, J. Kim, K.-W. Whang, and J. H. Joo, J. Vac. Sci. Technol. A 14, 1007 (1996).
8. J. H. Keller, Plasma Phys. Controlled Fusion 39, A437 (1997).
9. S. Fujimura, K. Shinagawa, and M. Nakamura, J. Vac. Sci. Technol. B 9, 357 (1991).
10. J. E. Spencer and R. A. Borel, J. Electrochem. Soc. 133, 1922 (1986).
11. M. Edamura, K. Meada, T. Usui, and M. Arai, Proc.-Electrochem. Soc. 98-4, 254 (1998).
12. H.-J. Lee, H.-S. Tae, Y.-T. Kim, and K.-W. Whang, IEEE Trans. Plasma Sci. 27, 52 (1999).
13. B.-H. O, C.-W. Kim, S.-B. Jo, and S.-G. Park, Presented at the ICMCTF Conference San Diego, CA, 2001.
14. M. V. Malyshev, V. M. Donnelly, and J. I. Colonell, J. Appl. Phys. 86, 4813 (1999).
15. J.-H. Kim, C.-J. Kang, T.-H. Ahn, and J.-T. Moon, Thin Solid Films 124-129, 345 (1999).
16. C.-J. Choi, O.-S. Kwon, and Y.-S. Seol, Jpn. J. Appl. Phys., Part 1 37, 6894 (1999).