Wettability of nanoengineered dual-roughness surfaces fabricated by UV-assisted capillary force lithography

Journal of Colloid and Interface Science

Volumn 339, Issue 1, 2009, Pages 202-207

  Jeong, Hoon Eui ^a   Kwak, Moon Kyu ^a   Park, Chan Ick ^a   Suh, Kahp Yang ^a,b  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

Dual roughness; Hierarchical structure; Lithography; Wettability

Indexed keywords

CAPILLARY FORCE LITHOGRAPHY; CASSIE STATE; DUAL ROUGHNESS; HIERARCHICAL STRUCTURE; HOMOGENEOUS CONTACTS; MICRO AND NANOSTRUCTURES; NANO SCALE; POLYMER MOLDS; POLYMER STRUCTURE; POLYURETHANE ACRYLATES; ROUGHNESS STRUCTURES; ROUGHNESS SURFACES; SEQUENTIAL APPLICATIONS; STATIC CONTACT ANGLE; THERMODYNAMIC MODEL; UV CURABLE; VAPOR PHASE; WATER DROPLETS; WENZEL STATE; WETTABILITY; WETTING TRANSITIONS;

CONTACT ANGLE; CURING; DROP FORMATION; HYDROPHOBICITY; NANOFLUIDICS; NANOSTRUCTURES; RESINS; SILANES; SURFACE TREATMENT; WETTING;

LITHOGRAPHY;

ACRYLIC ACID DERIVATIVE; POLYMER; POLYURETHANE ACRYLATE; SILANE DERIVATIVE; TRICHLORO(1H,1H,2H,2H PERFLUOROOCTYL)SILANE; UNCLASSIFIED DRUG; WATER;

ANALYTIC METHOD; ARTICLE; CAPILLARY FORCE LITHOGRAPHY; CHEMICAL STRUCTURE; CONTACT ANGLE; CONTROLLED STUDY; HYDROPHOBICITY; HYSTERESIS; NANOENGINEERING; NANOFABRICATION; PHASE TRANSITION; PHYSICAL CHEMISTRY; PRIORITY JOURNAL; SURFACE PROPERTY; THERMODYNAMICS; ULTRAVIOLET RADIATION; VAPOR; WETTABILITY;

EID: 69249202237     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2009.07.020     Document Type: Article

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