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Volumn 106, Issue 3, 2009, Pages
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Pinning at template feature edges for step and flash imprint lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
AIR LIQUID INTERFACES;
APPLIED FORCES;
BULK LIQUID;
DRIVING FORCES;
PROCESS WINDOW;
RADIUS OF CURVATURE;
RESIDUAL LAYER THICKNESS;
STEP-AND-FLASH IMPRINT LITHOGRAPHY;
LIQUIDS;
NANOIMPRINT LITHOGRAPHY;
PRESSURE GRADIENT;
WINDOWS;
PHASE INTERFACES;
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EID: 69149108766
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3122599 Document Type: Article |
Times cited : (9)
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References (9)
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