SCOPUS 정보 검색 플랫폼

Volumn 95, Issue 6, 2009, Pages

Substrate Fermi level effects in photocatalysis on oxides: Properties of ultrathin TiO2 /Si films

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAPS; ISO-PROPANOLS; MODEL SYSTEM; NEAR-SURFACE; P-TYPE SILICON; P-TYPE SILICON WAFERS; PHOTOCATALYTIC PROPERTY; SI FILMS; TIO; ULTRA-THIN;

FERMI LEVEL; FERMIONS; MASS SPECTROMETRY; PHOTOCATALYSIS; REACTION RATES; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES;

SILICON WAFERS;

EID: 69049119240 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3196314 Document Type: Article

Times cited : (7)

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