A novel fabrication process for ultra-sharp, high-aspect ratio nano tips using (111) single crystalline silicon

TRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers

Volumn 2, Issue , 2003, Pages 1144-1145

  Park, Jaehong ^a   Park, Kidong ^a   Choi, Byoungdoo ^a   Koo, Kyo In ^a   Paik, Seung Joon ^a   Park, Sangjun ^a   Kim, Jongpal ^a   Cho, Dong Il Dan ^a  

^a Seoul National University   (South Korea)

Author keywords

Crystallization; Fabrication; Lithography; Micromachining; Passivation; Residual stresses; Scanning probe microscopy; Semiconductor films; Silicon; Wet etching

Indexed keywords

ACTUATORS; COMPOSITE MICROMECHANICS; CRYSTALLINE MATERIALS; CRYSTALLIZATION; FABRICATION; LITHOGRAPHY; MICROMACHINING; MICROSYSTEMS; MONOCRYSTALLINE SILICON; NANOCANTILEVERS; NANOSENSORS; NANOTIPS; PASSIVATION; RESIDUAL STRESSES; SCANNING PROBE MICROSCOPY; SEMICONDUCTING SILICON; SILICON; SILICON WAFERS; SOLID-STATE SENSORS; TRANSDUCERS; WET ETCHING;

CONE ANGLE; FABRICATION PROCESS; HIGH ASPECT RATIO; RADIUS OF CURVATURE; SACRIFICIAL BULK MICROMACHINING; SEMICONDUCTOR FILMS; SILICON (111); SINGLE CRYSTALLINE SILICON;

ASPECT RATIO;

EID: 68849100261     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2003.1216972     Document Type: Conference Paper

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