Metallic seed layers for ion-beam assisted pulsed laser deposition of highly textured transition metal nitride films

Journal of Physics D: Applied Physics

Volumn 41, Issue 24, 2008, Pages

  Huhne R ^a   Guth K ^a   Kidszun, M ^a   Kaltofen, R ^a   Schultz, L ^a   Holzapfel, B ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS LAYER; AU FILM; BIAXIALLY TEXTURED; CONDUCTIVE BUFFER LAYER; CUBE TEXTURE; ELECTROPOLISHED; HASTELLOY; HOMOEPITAXIAL GROWTH; IN-PLANE ORIENTATION; REACTIVE DEPOSITION; ROCK-SALT STRUCTURE; ROOM TEMPERATURE; SEED LAYER; SURFACE TEXTURES; TRANSITION METAL NITRIDES; VARIOUS SUBSTRATES;

AMORPHOUS FILMS; BUFFER LAYERS; EPITAXIAL GROWTH; GOLD; HIGH TEMPERATURE SUPERCONDUCTORS; ION BEAMS; IONS; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTORY METAL COMPOUNDS; SUBSTRATES; TANTALUM; TEXTURES; TITANIUM NITRIDE; TRANSITION METALS; X RAY DIFFRACTION;

ION BEAM ASSISTED DEPOSITION;

EID: 68649103058     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/24/245404     Document Type: Article

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