SCOPUS 정보 검색 플랫폼

Volumn 48, Issue 6, 2009, Pages

Application of grating substrate fabricated by nanoimprint lithography to surface plasmon field-enhanced fluorescence microscopy and study of its optimum structure

(5) Akashi, Naoko a Tawa, Keiko a Tatsu, Yoshiro a Kintaka, Kenji a Nishii, Junji a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ENHANCED FLUORESCENCE; FABRICATION PROCESS; FLUORESCENCE IMAGE; FLUORESCENCE MICROSCOPES; FLUORESCENT DYES; GLASS SUBSTRATES; HIGH SENSITIVITY; LABELED CELLS; METAL LAYER; MICROSCOPIC OBSERVATIONS; NANO-BIOLOGY; SUB-WAVE LENGTH GRATING; SURFACE PLASMON FIELDS;

FABRICATION; FLUORESCENCE; FLUORESCENCE MICROSCOPY; LABELS; NANOIMPRINT LITHOGRAPHY; OPTICAL BEAM SPLITTERS; PLASMA ETCHING; PLASMONS; POLYMER FILMS; STRUCTURAL OPTIMIZATION; SURFACE PLASMON RESONANCE;

SUBSTRATES;

EID: 68649100019 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.062002 Document Type: Article

Times cited : (6)

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