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Volumn 100, Issue 9, 2006, Pages

Particle emission from tantalum plasma produced by 532 nm laser pulse ablation

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; GAS LASERS; LASER PULSES; MASS SPECTROMETRY; PLASMA DENSITY; TANTALUM;

EID: 33751106128     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2358400     Document Type: Article
Times cited : (31)

References (18)
  • 1
    • 0000333444 scopus 로고    scopus 로고
    • edited by D. B.Chrisey and G. K.Hubler (Wiley, New York, 1994), Cha, p
    • L. C. Chen, in Pulsed Laser Deposition of Thin Films, edited by, D. B. Chrisey, and, G. K. Hubler, (Wiley, New York, 1994), Chap., pp. 167-198.
    • Pulsed Laser Deposition of Thin Films , pp. 167-198
    • Chen, L.C.1
  • 8
    • 33751096558 scopus 로고    scopus 로고
    • http://www.hidenanalytical.com/products/
  • 9
    • 33751117315 scopus 로고    scopus 로고
    • http://cranessoftware.com/products/systat/
  • 11
    • 33751083418 scopus 로고    scopus 로고
    • Electron impact ion sources for charged heavy ions, edited by G. D.Shirkov and G.Zschornack (Vieweg, Gottingen
    • G. D. Shirkov and G. Zschornack, in Electron impact ion sources for charged heavy ions, edited by, G. D. Shirkov, and, G. Zschornack, (Vieweg, Gottingen, 1996).
    • (1996)
    • Shirkov, G.D.1    Zschornack, G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.