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Volumn 204, Issue 1-2, 2009, Pages 222-227
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Role of thermal stability and vapor pressure of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium(II) and its triamine adduct in producing magnesium oxide thin film using a plasma-assisted LICVD process
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LOYOLA COLLEGE
(India)
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Author keywords
Chemical vapor deposition (CVD); Coating; Plasma assisted liquid CVD; Scanning electron microscopy (SEM); Thermal properties; X ray diffraction
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Indexed keywords
ENERGY DISPERSIVE X-RAY;
EQUILIBRIUM VAPOR;
LIQUID INJECTIONS;
MAGNESIUM OXIDES;
PRECURSOR COMPLEXES;
RECIPROCAL TEMPERATURE;
STANDARD ENTHALPY;
STRAIGHT LINES;
TEMPERATURE DEPENDENCE;
TETRAMETHYL;
THERMAL PROPERTIES;
THERMAL STABILITY;
VARIOUS SUBSTRATES;
DEPOSITION;
DIFFRACTION;
ELECTRON MICROSCOPES;
HYDROSTATIC PRESSURE;
LIQUIDS;
MAGNESIUM;
OXIDE FILMS;
PLASMA DEPOSITION;
PLASMA STABILITY;
PLASMAS;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
SUBSTRATES;
THERMODYNAMIC PROPERTIES;
THIN FILMS;
VAPOR PRESSURE;
VAPORS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
CHEMICAL VAPOR DEPOSITION;
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EID: 68549099492
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.07.022 Document Type: Article |
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Times cited : (13)
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References (24)
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