Increasing permittivity in HfZrO thin films by surface manipulation

Applied Physics Letters

Volumn 95, Issue 5, 2009, Pages

  Boscke T S ^a   Hung, P Y ^b   Kirsch, P D ^b   Quevedo Lopez, M A ^c   Ramirez Bon R ^d  

^a QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^b SEMATECH   (United States)

^c UT Dallas   (United States)

^d DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ATR FTIR; ATTENUATED TOTAL REFLECTION FOURIER TRANSFORM INFRARED; DIELECTRIC CONSTANTS; NANO SCALE; PHASE FORMATIONS; PHYSICAL CHARACTERIZATION; SURFACE ENERGIES; SURFACE MANIPULATION; TETRAGONAL PHASE; THERMODYNAMIC MODEL; TOP SURFACE; XRD;

CERAMIC CAPACITORS; DIELECTRIC WAVEGUIDES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HAFNIUM; PERMITTIVITY; SURFACE CHEMISTRY; SURFACE TENSION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ZIRCONIUM ALLOYS;

EID: 68349150676     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3195623     Document Type: Article

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