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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 4, 2009, Pages 1801-1804

Fabrication of high quality factor photonic crystal microcavities in InAsP/InP membranes combining reactive ion beam etching and reactive ion etching

(4) Martinez L J a Prieto, I a Aln B a Postigo, P A a

a INSTITUTO DE MICROELECTRÓNICA DE MADRID (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL WET ETCHING; E-BEAM LITHOGRAPHY; FABRICATED STRUCTURES; HIGH QUALITY FACTORS; INP; LASER EMISSION; PHOTONIC CRYSTAL MEMBRANES; PHOTONIC CRYSTAL MICROCAVITIES; PUMP POWER; QUALITY FACTORS; REACTIVE ION BEAM ETCHING; SACRIFICIAL LAYER;

BANDPASS FILTERS; CRYSTAL ATOMIC STRUCTURE; FABRICATION; GAS MIXTURES; ION BEAMS; IONS; LASER EXCITATION; MICROCAVITIES; PHOTONIC CRYSTALS; PUMPING (LASER); Q FACTOR MEASUREMENT; WET ETCHING;

REACTIVE ION ETCHING;

EID: 68349131931 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.3151832 Document Type: Article

Times cited : (19)

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