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Volumn 19, Issue 5, 2009, Pages

New release technique of a thick sacrificial layer and residue effects on novel half-coaxial transmission line filters

Author keywords

[No Author keywords available]

Indexed keywords

COAXIAL TRANSMISSION LINES; FABRICATION YIELD; GAP FILTER; MICROMACHINED; MICROMACHINED DEVICES; OXYGEN PLASMA ASHING; PROCESS TIME; RELEASE METHODS; REPRODUCIBILITIES; SACRIFICIAL LAYER;

EID: 68249135725     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/5/055018     Document Type: Article
Times cited : (7)

References (15)
  • 4
    • 0031634749 scopus 로고    scopus 로고
    • Low loss micromachined filters for millimeter-wave telecommunication systems
    • Blondy P, Brown A R, Cross D and Rebeiz G M 1998 Low loss micromachined filters for millimeter-wave telecommunication systems IEEE MTT-S Digest 1181-4
    • (1998) IEEE MTT-S Digest , pp. 1181-1184
    • Blondy, P.1    Brown, A.R.2    Cross, D.3    Rebeiz, G.M.4
  • 11
    • 0036544396 scopus 로고    scopus 로고
    • High aspect ratio ultrathick micro-stencil by JSR THB-430N negative UV photoresist
    • Tseng F-G and Yu C-S 2002 High aspect ratio ultrathick micro-stencil by JSR THB-430N negative UV photoresist Sensor Actuators A 97-98 764-70
    • (2002) Sensor Actuators , vol.97-98 , pp. 764-770
    • Tseng, F.-G.1    Yu, C.-S.2
  • 12
    • 33747242692 scopus 로고    scopus 로고
    • A thick photoresist process for advanced wafer level packaging applications using JSR THB-151N negative tone UV photoresist
    • Rao V S, Kripesh V, Yoon S W and Tay A 2006 A thick photoresist process for advanced wafer level packaging applications using JSR THB-151N negative tone UV photoresist J. Micromech. Microeng. 16 1841-6
    • (2006) J. Micromech. Microeng. , vol.16 , pp. 1841-1846
    • Rao, V.S.1    Kripesh, V.2    Yoon, S.W.3    Tay, A.4
  • 13
    • 48349145880 scopus 로고    scopus 로고
    • The swelling effects during the development processes of deep UV lithography of SU-8 photoresists: theoretical study, simulation and verification
    • Zhou Z, Huang Q-A, Li W, Lu W, Zhu Z and Feng M 2007 The swelling effects during the development processes of deep UV lithography of SU-8 photoresists: theoretical study, simulation and verification Proc. 6th IEEE Conf. on Sensors pp 325-8
    • (2007) Proc. 6th IEEE Conf. on Sensors , pp. 325-328
    • Zhou, Z.1    Huang, Q.-A.2    Li, W.3    Lu, W.4    Zhu, Z.5    Feng, M.6
  • 14
    • 0034430581 scopus 로고    scopus 로고
    • Novel micromachined coplanar waveguide transmission lines for application in millimeter-wave circuits
    • Park J-H, Baek C-W, Jung S, Kim H-T, Kwon Y and Kim Y-K 2000 Novel micromachined coplanar waveguide transmission lines for application in millimeter-wave circuits Japan. J. Appl. Phys. 39 7120-4
    • (2000) Japan. J. Appl. Phys. , vol.39 , pp. 7120-7124
    • Park, J.-H.1    Baek, C.-W.2    Jung, S.3    Kim, H.-T.4    Kwon, Y.5    Kim, Y.-K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.