Relaxation of dielectric loss peak over intermediate temperature range in Bi5TiNbWO15 intergrowth

Chinese Physics Letters

Volumn 26, Issue 4, 2009, Pages

  Wang, Wei ^a   Wang, Xiao Juan ^a   Zhu, Jun ^a   Mao, Xiang Yu ^a   Chen, Xiao Bing ^a  

^a YANGZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BISMUTH COMPOUNDS; DIELECTRIC DEVICES; DIELECTRIC RELAXATION; OXYGEN VACANCIES; TITANIUM ALLOYS; TITANIUM COMPOUNDS;

COLE COLES; COMBINED EFFECT; DIELECTRIC RELAXATION PROCESS; FITTING PARAMETERS; INTERGROWTH; INTERMEDIATE TEMPERATURES; RELAXATION STRENGTH; STRONG CORRELATION; TEMPERATURE DEPENDENT BEHAVIOR; TEMPERATURE RANGE;

DIELECTRIC LOSSES;

EID: 68149123654     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/26/4/047701     Document Type: Article

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