XPS characterisation of vacuum annealed nanocrystalline WO3 films

e-Journal of Surface Science and Nanotechnology

Volumn 7, Issue , 2009, Pages 319-322

  Maffeis, T G G ^a   Penny, M W ^a   Cobley, R J ^a   Comini, E ^b   Sberveglieri, G ^b   Wilks, S P ^a  

^a SWANSEA UNIVERSITY   (United Kingdom)

^b INFM   (Italy)

Author keywords

Polycrystalline surfaces; Polycrystalline thin films; Tungsten oxide; X ray photoelectron spectroscopy

Indexed keywords

DEPOSITION; GAS SENSING ELECTRODES; NANOCRYSTALS; OXIDE FILMS; PHOTOELECTRONS; PHOTONS; THIN FILMS; TUNGSTEN COMPOUNDS;

GAS SENSING; NANOCRYSTALLINES; OXYGEN MIGRATION; POLYCRYSTALLINE SURFACE; POLYCRYSTALLINE THIN FILM; SURFACE BAND BENDING; TUNGSTEN OXIDE; WO3 THIN FILMS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 68049129682     PISSN: None     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2009.319     Document Type: Conference Paper

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