NOVEL "topography-sensitive" bottom-up growth of ruthenium and) copper for filling nano-features using supercritical co2 fluids: Beyond scalability

Materials Research Society Symposium Proceedings

Volumn 992, Issue , 2007, Pages 7-12

  Kondoh, E ^a   Hirose, M ^a   Ukai, E ^a   Nagano, K ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDENSATION; CONDENSATION REACTIONS; COPPER; DEPOSITION; RUTHENIUM;

BOTTOM UP; CAPILLARY CONDENSATION; DENSE MEDIA; DEPOSITION PRECURSORS; DEPOSITION PROCESS; REACTION CHEMISTRY; SUPERCRITICAL CO; SUPERCRITICAL CO2;

TOPOGRAPHY;

EID: 67749120093     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0992-d02-03     Document Type: Conference Paper

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