The atomic model of the Sn plasmas for the EUV source

Journal of Physics: Conference Series

Volumn 163, Issue , 2009, Pages

  Sasaki, Akira ^a,f   Sunahara, Atsushi ^a   Nishihara, Katsunobu ^b   Nishikawa, Takeshi ^c   Koike, Fumihiro ^d   Tanuma, Hajime ^e  

^a Japan Atomic Energy Agency   (Japan)

^b INSTITUTE FOR LASER TECHNOLOGY   (Japan)

^c OSAKA UNIVERSITY   (Japan)

^d OKAYAMA UNIVERSITY   (Japan)

^e KITASATO UNIVERSITY   (Japan)

^f TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 67650693040     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/163/1/012107     Document Type: Article

References (9)

1. - 2005 EUV Sources for Lithography ed V Bakshi (SPIE press)
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3. Sasaki A, et al 2004 Appl. Phys. Lett. 85 5857
4. Nishihara K, et al 2008 Phys. Plasmas 15 056708
5. A Bar-Shalom, M Klapisch and J Oreg 2001 J. Quant. Spectrosc. Radiat. Transfer 71 169
6. Lokke W A and W H Grasberger 1977 Lawrence Livermore Laboratory Report UCRL-52276
7. Sasaki A, et al 2007 HEDP 3 250
8. C Bauche-Arnoult, J Bauche and M Klapisch 1985 Phys. Rev. A 31 2248
9. Tanuma H, et al 2007 J. Phys. Conf. Ser. 58 231