SCOPUS 정보 검색 플랫폼

Volumn 9, Issue 14, 2009, Pages 1994-1996

Laminar flow used as "liquid etch mask" in wet chemical etching to generate glass microstructures with an improved aspect ratio

(6) Mu, Xuan a,b Liang, Qionglin b Hu, Ping a Ren, Kangning b Wang, Yiming b Luo, Guoan a,b

a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

b Tsinghua University (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIMETICONE; GLASS;

ANISOTROPY; ARTICLE; CHEMICAL ANALYSIS; COST EFFECTIVENESS ANALYSIS; LAMINAR FLOW; LAMINAR FLOW ASSISTED WET ETCHING; LIQUID; LIQUID ETCH MASK; MATERIALS TESTING; NONHUMAN; PHYSICAL CHEMISTRY; PRIORITY JOURNAL; PROCESS OPTIMIZATION; SOLID;

EID: 67650475426 PISSN: 14730197 EISSN: 14730189 Source Type: Journal
DOI: 10.1039/b904769g Document Type: Article

Times cited : (29)

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