The influence of CH4 carrier gas in plasma polymerized styrene films

Surface and Coatings Technology

Volumn 182, Issue 1, 2004, Pages 1-6

  Kim, Jong Taek ^a   Lim, Kyung Bum ^a   Lee, Duck Chool ^a  

^a Inha University   (South Korea)

Author keywords

CH4; Plasma Polymerization; Reactive carrier gas; Styrene film

Indexed keywords

CROSSLINKING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS CHROMATOGRAPHY; LITHOGRAPHY; MOLECULAR WEIGHT DISTRIBUTION; MONOMERS; OPTOELECTRONIC DEVICES; PLASMA POLYMERIZATION; PYROLYSIS; SENSORS; STYRENE; SURFACE MEASUREMENT;

PLASMA POLYMERIZED STYRENE FILMS; REACTIVE CARRIER GAS;

PLASTIC FILMS;

COATING;

EID: 1842585567     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.08.046     Document Type: Article

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