Total internal reflection microscopy: a subsurface defects identification technique in optically transparent components

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams

Volumn 21, Issue 6, 2009, Pages 835-840

  Deng, Yan ^a   Xu, Qiao ^a   Chai, Liqun ^a   Xu, Jiancheng ^a   Shi, Qikai ^a   Luo, Jin ^a  

^a CHENGDU FINE OPTICAL ENGINEERING RESEARCH CENTER   (China)

Author keywords

Focusing; Polarization; Standing wave; Subsurface defect; Total internal reflection

Indexed keywords

FOCUSING DISTANCE; HIGH RESISTANCE; IDENTIFICATION TECHNIQUES; ILLUMINATION DISTRIBUTION; INCIDENT ANGLES; OPTICAL PROCESS; STANDING WAVE; SUBSURFACE DEFECT; TEST TECHNIQUES; TOTAL INTERNAL REFLECTION; TOTAL INTERNAL REFLECTION MICROSCOPY; TOTAL INTERNAL REFLECTIONS;

ELASTIC WAVES; POLARIZATION; REFLECTION; REFRACTIVE INDEX; STANDING WAVE METERS; WAVES;

DEFECTS;

EID: 67650266478     PISSN: 10014322     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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