Application of total internal reflection microscopy for laser damage studies on fused silica

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3244, Issue , 1997, Pages 282-295

  Sheehan, Lynn M ^a   Kozlowski, Mark ^a   Camp, David W ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Atomic Force Microscopy; Fused Silica; Laser Induced Damage; Localized Scatter; Total Internal Reflection Microscopy

Indexed keywords

CRYSTAL DEFECTS; FUSED SILICA; LIGHT REFLECTION; LIGHT SCATTERING; NEODYMIUM LASERS; OPTICAL MICROSCOPY;

DAMAGE RESISTANCE; TOTAL INTERNAL REFLECTION MICROSCOPY (TIRM);

LASER DAMAGE;

EID: 0031289610     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.307030     Document Type: Conference Paper

References (7)

1. Examination of laser damage sites of transparent surfaces and films using total internal reflection microscopy
2. Total internal reflection microscopy: A surface inspection technique
3. Total internal reflection microscopy: Inspection of surfaces of high bulk scatter materials
4. Subsurface damage identification in optically transparent materials using a nondestructive method
5. Total internal reflection microscopy (TIRM) as a nondestructive subsurface damage assessment tool
6. R-on-1 automatic mapping: A new tool for laser damage testing
7. Subsurface damage in optical materials: Origin, measurement, and removal